期刊


ISSN1063-7397
刊名Russian Microelectronics
参考译名俄罗斯微电子学
收藏年代2002～2023



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2008 2009 2010 2011 2012 2013
2014 2015 2016 2017 2018 2019
2020 2021 2022 2023

2022, vol.51, no.1 2022, vol.51, no.2 2022, vol.51, no.3 2022, vol.51, no.4 2022, vol.51, no.5 2022, vol.51, no.6
2022, vol.51, no.7 2022, vol.51, no.8

题名作者出版年年卷期
Magnetic Permeability of Co–Ni–Fe Alloy Films Obtained by Electrochemical DepositionTikhonov R. D.; Cheremisinov A. A.; Tikhonov M. R.20222022, vol.51, no.5
Features of the Operation of a Three-Electrode Electrostatic Microgenerator in the Presence of Collisions between ElectrodesDragunov V. P.; Ostertak D. I.; Sinitskiy R. E.; Dragunova E. V.20222022, vol.51, no.5
Investigation of the Thermophysical Properties of the SiGe Semiconductor MaterialShorstov S. Yu.; Marakhovsky P. S.; Barinov D. Ya.; Razmakhov M. G.20222022, vol.51, no.5
Active Integral High Pass FiltersRekhviashvili S. Sh.20222022, vol.51, no.5
Memristive Properties of Manganite-Based Planar StructuresTulina N. A.; Shmytko I. M.; Ivanov A. A.; Rossolenko A. N.; Zotov A. V.; Borisenko I. Y.; Sirorkin V. V.; Tulin V. A.20222022, vol.51, no.5
On the Mechanisms Regulating the Plasma Composition and Kinetics of Heterogeneous Processes in a CF4 + CHF3 + Ar MixtureEfremov A. M.; Betelin V. B.; Kwon K.-H.20222022, vol.51, no.5
Study of the Thermal Stability of Copper Contact Junctions in Si/SiO2 SubstratesVorobieva A. I.; Labunov V. A.; Utkina E. A.; Khodin A. A.; Sycheva O. A.; Ezovitova T. I.20222022, vol.51, no.5
Active Rectifier with Low LossesBabenko V. P.; Bityukov V. K.20222022, vol.51, no.5
Erratum to: Application of the Tikhonov Regularization Method in Problems of Ellipsometic Porometry of Low-K DielectricsGaidukasov R. A.; Myakon’kikh A. V.; Rudenko K. V.20222022, vol.51, no.5
Study of the Effect of Self-Heating in High-Voltage SOI Transistors with a Large Drift RegionRumyantsev S. V.; Novoselov A. S.; Masalsky N. V.20222022, vol.51, no.5



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