国家工程技术图书馆第一分馆 | 机械分馆 | 机械工业信息研究院 | library.gmachineinfo.com

期刊

全部

2018, vol.47, no.1	2018, vol.47, no.2	2018, vol.47, no.3	2018, vol.47, no.4	2018, vol.47, no.5	2018, vol.47, no.6
2018, vol.47, no.7	2018, vol.47, no.8

题名	作者	出版年	年卷期
Simulation of the Characteristics of Double-Gate Asymmetrically Doped SOI CMOS Nanotransistors	N. V. Masalsky	2018	2018, vol.47, no.4
Structuring Copper in the Plasma Medium of a High-Frequency Discharge	A. V. Dunaev; D. B. Murin	2018	2018, vol.47, no.4
Effect of the Distribution of the Radiation Defect on the Field-Emission Properties of Silicon Crystals	R. K. Yafarov; V. P. Timoshenkov	2018	2018, vol.47, no.4
A Thin-Film Platform for Chemical Gas Sensors	I. V. Roslyakov; K. S. Napolskii; V. S. Stolyarov; E. E. Karpov; A. V. Ivashev; V. N. Surtaev	2018	2018, vol.47, no.4
Features of the Current Flow in Injection Structures Based on PbSnTe:In Films	D. V. Ishchenko; I. G. Neizvestnyi; N. S. Pashchin; V. N. Sherstyakova	2018	2018, vol.47, no.4
Quantum Gates with Spin States in Continuous Microwave Field	A. F. Zinovieva; A. V. Nenashev; A. A. Koshkarev; T. S. Zarodnyuk; A. Yu. Gornov; A. V. Dvurechenskii	2018	2018, vol.47, no.4
On the Effect of the Ratio of Concentrations of Fluorocarbon Components in a CF4+ C4F8+ Ar Mixture on the Parameters of Plasma and SiO2/Si Etching Selectivity	A. M. Efremov; D. B. Murin; K.-H. Kwon	2018	2018, vol.47, no.4
The Effect of the Mixture Composition on the Electrophysical Parameters of HCl/N2Plasma	S. A. Pivovarenok	2018	2018, vol.47, no.4