期刊


ISSN0946-7076
刊名Microsystem technologies
参考译名微系统技术：传感器，致动器与系统集成
收藏年代1998～2024

关联期刊参考译名收藏年代
Journal of Information Storage and Processing Systems存储与处理系统信息杂志2000～2001


全部

1998 1999 2000 2001 2002 2003
2004 2005 2006 2007 2008 2009
2010 2011 2012 2013 2014 2015
2016 2017 2018 2019 2020 2021
2022 2023 2024

2014, vol.20, no.1 2014, vol.20, no.10/11 2014, vol.20, no.12 2014, vol.20, no.2 2014, vol.20, no.3 2014, vol.20, no.4/5
2014, vol.20, no.6 2014, vol.20, no.7 2014, vol.20, no.8/9

题名作者出版年年卷期
Nanoimprint lithography and micro-embossing in LiGA technology: similarities and differencesHelmut Schift20142014, vol.20, no.10/11
SAM meets MEMS: reliable fabrication of stable Au-patterns embedded in PDMS using dry peel-off processIkjoo Byun; Anthony W. Coleman; Beomjoon Kim20142014, vol.20, no.10/11
ViPER: simulation software for high aspect ratio plasma etching of siliconValentyn Ishchuk; Burkhard E. Volland; Ivo W. Rangelow20142014, vol.20, no.10/11
High-aspect-ratio nanoporous membranes made by reactive ion etching and e-beam and interference lithographyRalu Divan; Olga V. Makarova; Shelby Skoog; Roger Narayan; Anirudha V. Sumant; Cha-Mei Tang; Nicolaie Moldovan20142014, vol.20, no.10/11
IR-drying of photoresists: experimental and theoretical consideration of drying kinetics of mono- and multi-layered coatingsM. Schonfeld; S. Schubert; J. Saupe; J. Grimm20142014, vol.20, no.10/11
Large tuning ratio high aspect ratio variable capacitors using leveraged bendingS. Achenbach; D. T. Haluzan; D. M. Klymyshyn; M. Borner; J. Mohr20142014, vol.20, no.10/11
Arrays of high-aspect ratio microchannels for high-throughput isolation of circulating tumor cells (CTCs)Mateusz L. Hupert; Joshua M. Jackson; Hong Wang; Malgorzata A. Witek; Joyce Kamande; Matthew I. Milowsky; Young E. Whang; Steven A. Soper20142014, vol.20, no.10/11
Fabrication of porous anodic aluminum oxide by hybrid pulse anodization at relatively high potentialC. K. Chung; M. W. Liao; O. K. Khor20142014, vol.20, no.10/11
2~N Period submicron grating at the inner wall of a metal cylinderH. Hirshy; S. G. Scholz; Y. Jourlin; S. Tonchev; S. Reynaud; A. Boukenter; O. Parriaux20142014, vol.20, no.10/11
Advanced mask aligner lithography (AMALITH) for thick photoresistReinhard Voelkel; Uwe Vogler; Arianna Bramati; Marc Hennemeyer; Ralph Zoberbier; Anja Voigt; Gabi Grutzner; Nezih Unal; Ulrich Hofmann20142014, vol.20, no.10/11
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