期刊


ISSN1042-7147
刊名Polymers for advanced technologies
参考译名先进技术聚合物
收藏年代2002～2023

关联期刊参考译名收藏年代
Polymers for Advanced Technologies先进技术聚合物2023～2024


全部

2002 2003 2004 2005 2006 2007
2008 2009 2010 2011 2012 2013
2014 2015 2016 2017 2018 2019
2020 2021 2022 2023

2006, vol.17, no.1 2006, vol.17, no.11-12 2006, vol.17, no.2 2006, vol.17, no.3 2006, vol.17, no.4 2006, vol.17, no.5
2006, vol.17, no.6 2006, vol.17, no.7-8 2006, vol.17, no.9-10

题名作者出版年年卷期
Recent developments in the use of two-photon polymerization in precise 2D and 3D microfabricationsKwang-Sup Lee; Dong-Yol Yang; Sang Hu Park; Ran Hee Kim20062006, vol.17, no.2
Fabricating three-dimensional polymeric photonic structures by multi-beam interference lithographyJun Hyuk Moon; Jamie Ford; Shu Yang20062006, vol.17, no.2
Recent progress in high resolution lithographyDaniel Bratton; Da Yang; Junyan Dai; Christopher K. Ober20062006, vol.17, no.2
ArF excimer laser resists based on fluoroalcoholH. Ito; H. D. Truong; R. D. Allen; W. Li; P. R. Varanasi; K.-J. Chen; M. Khojasteh; W.-S. Huang; S. D. Burns; D. Pfelffer20062006, vol.17, no.2
Depth profile and line-edge roughness of partially O-1-ethoxyethylated low molecular weight amorphous polyphenol and poly(p-hydroxystyrene) base resists for electron-beam lithographyTaku Hirayama; Daiju Shiono; Junichi Onodera; Atsuko Yamaguchi; Hiroshi Fukuda20062006, vol.17, no.2
Advanced materials for 193 nm immersion lithographyShiro Kusumdto; Motoyuki Shima; Yong Wang; Tsutomu Shimokawa; Hozumi Sato; Katsuhiko Hieda20062006, vol.17, no.2
Direct patterning of poly(amic acid) and low-temperature imidization using a photo-base generatorKen-ichi Fukukawa; Yuji Shibasaki; Mitsuru Ueda20062006, vol.17, no.2



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