期刊


ISSN0016-4232
刊名Galvanotechnik
参考译名电镀技术
收藏年代1998~2024



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1998 1999 2000 2001 2002 2003
2004 2005 2006 2007 2008 2009
2010 2011 2012 2013 2014 2015
2016 2017 2018 2019 2020 2021
2022 2023 2024

2001, vol.92, no.1 2001, vol.92, no.10 2001, vol.92, no.11 2001, vol.92, no.12 2001, vol.92, no.2 2001, vol.92, no.3
2001, vol.92, no.4 2001, vol.92, no.5 2001, vol.92, no.6 2001, vol.92, no.7 2001, vol.92, no.8 2001, vol.92, no.9

题名作者出版年年卷期
Benchmarking - comparison with standards and competitorsHasenpusch, W.20012001, vol.92, no.3
Electrodeposited Co-W alloys for production of compositionally-modulated CoW{sub}x/CoW{sub}y multilayersBratoeva, M.; Tzatscheva, Tz.; Boschkov, N.; Atanassov, N.20012001, vol.92, no.3
Comparative studies of cyanide-free zinc electrolytes with sodium & potassium hydroxide Part 2: electrolyte propertiesGrunwald, E.; Danciu, V.; Cosoveanu, V.; Ladiv, I. C.20012001, vol.92, no.3
Improved seal quality of anodised aluminum by means of controlled hydrodynamic conditions in the sealing tankRauscher, G.; Rogoll, V.20012001, vol.92, no.3
The modern chip-card - requirements and how they are metHoudeau, D.; Stampka, P.; Pushcner, F.20012001, vol.92, no.3
Development of reactively sputtered CrN coatings from a materials scientist's point of viewMayrhofer, P. H.; Tischler, G.; Mitterer, C.20012001, vol.92, no.3
Background history and concept of the Karlsruhe synchrotron beam sourceSaile, V.20012001, vol.92, no.3
Prospects and the vision for ANKASaile, V.; Einfeld, D.; Hesch, K.; Rossmnaith, R.; Steininger, R.; Moser, H. O.20012001, vol.92, no.3
Treatment of chromium-containing effluent by chemical precipitationPanayotova, T.; Dimova-Todorova, M.; Dobrevsky, I.20012001, vol.92, no.3