期刊


ISSN0013-4686
刊名Electrochimica Acta
参考译名国际电化学杂志：电化学学报
收藏年代1998～2024



全部

1998 1999 2000 2001 2002 2003
2004 2005 2006 2007 2008 2009
2010 2011 2012 2013 2014 2015
2016 2017 2018 2019 2020 2021
2022 2023 2024

2000, vol.45, no.10 2000, vol.45, no.11 2000, vol.45, no.12 2000, vol.45, no.13 2000, vol.45, no.14 2000, vol.45, no.15-16
2000, vol.45, no.17 2000, vol.45, no.18 2000, vol.45, no.19 2000, vol.45, no.20 2000, vol.45, no.21 2000, vol.45, no.22-23
2000, vol.45, no.24 2000, vol.45, no.25-26 2000, vol.45, no.27 2000, vol.45, no.28 2000, vol.45, no.8-9 2000, vol.46, no.1
2000, vol.46, no.2-3 2000, vol.46, no.4 2000, vol.46, no.5

题名作者出版年年卷期
Boron doped diamond (BDD)-layers on titanium substrates as electrodes in applied electrochemistryF. Beck; W. Kaiser; H. Krohn20002000, vol.45, no.28
Electron transport and back reaction in dye sensitised nanocrystalline photovoltaic cellsL. M. Peter; K. G. U. Wijayantha20002000, vol.45, no.28
Fast processes at semiconductor-liquid interfaces: reactions at GaAs electrodesKerstin Siemoneit; Rolf Reineke-Koch; Andreas Meier; Rudiger Memming20002000, vol.45, no.28
Formation and corrosion of InP/In contacts in hydrochloric acidAchim Walter Hassel; Matsuhide Aihara; Masahiro Seo20002000, vol.45, no.28
In-situ atomic force microscopy of silicon (100) in aqueous potassium hydroxideP. Raisch; W. Haiss; R. J. Nichols; D. J. Schiffrin20002000, vol.45, no.28
Is there a limit for the passivation of Si surfaces during anodic oxidation in acidic NH{sub}4F solutions?J. Rappich; V. Yu. Timoshenko; R. Wurz; Th. Dittrich20002000, vol.45, no.28
Metal deposition on n-Si(111):H electrodesJ. C. Ziegler; A. Reitzle; O. Bunk; J. Zegenhagen; D. M. Kolb20002000, vol.45, no.28
Metal sulfide semiconductor electrochemical mechanisms induced by bacterial activityH. Tributsch; J. A. Rojas-Chapana20002000, vol.45, no.28
Reactions of Si-H to Si-X (X = halogen) bonds at H-terminated Si(111) surfaces in hydrogen halide solutions in the presence of oxidantsXiaowen Zhou; Masaki Ishida; Akihito Imanishi; Yoshihiro Nakato20002000, vol.45, no.28
Surface analysis of the electropolishing layer on Si(111) in ammonium fluoride solutionH. J. Lewerenz; H. Jungblut; S. Rauscher20002000, vol.45, no.28
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